Deposition durability of e-beam mask repair

Thorsten Krome; Christian Holfeld; Tim Göhler; Pavel Nesladek

doi:10.1117/12.2323905

19 September 2018 Deposition durability of e-beam mask repair

Thorsten Krome, Christian Holfeld, Tim Göhler, Pavel Nesladek

Proceedings Volume 10775, 34th European Mask and Lithography Conference; 1077511 (2018) https://doi.org/10.1117/12.2323905
Event: 34th European Mask and Lithography Conference, 2018, Grenoble, France

Abstract

The durability of deposition repairs of two different e-beam mask repair tools has been examined and compared in this work. To obtain this data, clear defects on production masks have been repaired with both tools. In between these repairs the mask was used for production and gathered exposure dose accordingly. The increase of transmission and hence the degradation of the deposition has been determined by AIMSTM. We could confirm that one tool/process shows better stability of the depositions than the other.

Citation Download Citation

Thorsten Krome, Christian Holfeld, Tim Göhler, and Pavel Nesladek "Deposition durability of e-beam mask repair", Proc. SPIE 10775, 34th European Mask and Lithography Conference, 1077511 (19 September 2018); https://doi.org/10.1117/12.2323905

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