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17 September 2018 Femtosecond laser three-dimensional exposure of silica substrate in the non-ablative regime: From laser-induced modifications to applications (Conference Presentation)
Yves Bellouard
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Proceedings Volume 10753, Ultrafast Nonlinear Imaging and Spectroscopy VI; 107530U (2018) https://doi.org/10.1117/12.2321340
Event: SPIE Optical Engineering + Applications, 2018, San Diego, California, United States
Abstract
Thanks to non-linear absorption processes, non-ablative femtosecond laser pulses applied to fused silica induce bulk morphological transformations in the material associated with a variety of local changes of physical properties. These structural changes includes locally densified glass matrices, self-organized nanostructures as well as the formation of polymorphic phases. As a direct consequence, the material experiences localized volume variation resulting in either tensile or compressive stress, which intensity and direction are both controlled by the pulse energy and the laser polarization, respectively. Here, we will discuss these laser modifications, both from the viewpoint of stress-states and structural changes induced in the material. In particular, we will show how these controlled states along with this ability to tune material properties can be used for novel applications in optomechanics, such as tunable Duffing oscillators, embedded optical wave plates, but also, as a means to investigate mechanical properties at the small scales and for the packaging of complex optical devices.
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Yves Bellouard "Femtosecond laser three-dimensional exposure of silica substrate in the non-ablative regime: From laser-induced modifications to applications (Conference Presentation)", Proc. SPIE 10753, Ultrafast Nonlinear Imaging and Spectroscopy VI, 107530U (17 September 2018); https://doi.org/10.1117/12.2321340
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KEYWORDS
Femtosecond phenomena
Silica
Laser applications
Absorption
Glasses
Laser energy
Laser processing
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