Application specific ratings of filters for negative-tone developer

Toru Umeda; Yukihisa Kawada; Kazushi Masuda; Naoya Iguchi; Tetsuya Murakami; Shuichi Tsuzuki

doi:10.1117/12.2297164

13 March 2018 Application specific ratings of filters for negative-tone developer

Toru Umeda, Yukihisa Kawada, Kazushi Masuda, Naoya Iguchi, Tetsuya Murakami, Shuichi Tsuzuki

Proceedings Volume 10586, Advances in Patterning Materials and Processes XXXV; 1058616 (2018) https://doi.org/10.1117/12.2297164
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Negative tone development is being employed widely because of its superior resolution. Pall is developing filtration products specially targeted for these high resolution applications. High particle retention and low extractables are key aspects of filtration products known to improve on-wafer defectivity. In the current study, we have found that filtration efficiency of the various filter types towards palladium-heptylamine nanoparticles correlates strongly to actual particle removal determined by on-wafer inspection metrology. Furthermore, using the afore mentioned nanoparticle testing metrology, high retention membranes with low extractables were selected. Particle challenge testing is much simpler than on-wafer defectivity inspection and enables faster and effective filtration membrane selection. Based on these results, the selected filtration membrane is expected to perform effective real particle removal in negative tone developer.

Citation Download Citation

Toru Umeda, Yukihisa Kawada, Kazushi Masuda, Naoya Iguchi, Tetsuya Murakami, and Shuichi Tsuzuki "Application specific ratings of filters for negative-tone developer", Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 1058616 (13 March 2018); https://doi.org/10.1117/12.2297164

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