Higher order intra-field alignment for intra-wafer lens and reticle heating control

Charlie Chen; En-Chuan Lio; Hsiao Lin Hsu; Jia Hung Chang; Sho Shen Lee; Patrick Lomtscher; Boris Habets; Georg Erley; Norman Birnstein; Steven Tottewitz; Rex Liu

doi:10.1117/12.2297358

13 March 2018 Higher order intra-field alignment for intra-wafer lens and reticle heating control

Charlie Chen, En-Chuan Lio, Hsiao Lin Hsu, Jia Hung Chang, Sho Shen Lee, Patrick Lomtscher, Boris Habets, Georg Erley, Norman Birnstein, Steven Tottewitz, Rex Liu

Author Affiliations +

Proceedings Volume 10585, Metrology, Inspection, and Process Control for Microlithography XXXII; 105851R (2018) https://doi.org/10.1117/12.2297358
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Before each wafer exposure, the photo lithography scanner’s alignment system measures alignment marks to correct for placement errors and wafer deformation. To minimize throughput impact, the number of alignment measurements is limited. Usually, the wafer alignment does not correct for intrafield effects. However, after calibration of lens and reticle heating, residual heating effects remain. A set of wafers is exposed with special reticles containing many alignment marks, enabling intra-field alignment. Reticles with a dense alignment layout have been used, with different defined intra-field bias. In addition, overlay simulations are performed with dedicated higher order intra-field overlay models to compensate for wafer-to-wafer and across-wafer heating.

Citation Download Citation

Charlie Chen, En-Chuan Lio, Hsiao Lin Hsu, Jia Hung Chang, Sho Shen Lee, Patrick Lomtscher, Boris Habets, Georg Erley, Norman Birnstein, Steven Tottewitz, and Rex Liu "Higher order intra-field alignment for intra-wafer lens and reticle heating control", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105851R (13 March 2018); https://doi.org/10.1117/12.2297358

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available