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18 May 1989 Laser-Assisted Deposition Of Thin Films For Optical Applications
D. Schafer, B. Brauns, R. Wolf, B. Steiger, G. Zscherpe
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Proceedings Volume 1033, Trends in Quantum Electronics; (1989) https://doi.org/10.1117/12.950660
Event: International Conference on Trends in Quantum Electronics, 1988, Bucharest, Romania
Abstract
A 200 W cw CO2, laser was used to evaporate high refractory oxides, for laser substrate irradiation before the deposition and for modification of the electron beam deposition process. For the laser-assisted thin film deposition processes higher values of laser damage resistance and a correlation between laser damage resistance and absorption were found.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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D. Schafer, B. Brauns, R. Wolf, B. Steiger, and G. Zscherpe "Laser-Assisted Deposition Of Thin Films For Optical Applications", Proc. SPIE 1033, Trends in Quantum Electronics, (18 May 1989); https://doi.org/10.1117/12.950660
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KEYWORDS
Absorption
Laser damage threshold
Electron beams
Laser induced damage
Resistance
Mirrors
Thin films
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