The thermal damage process of the contaminated optical element used in high energy laser system

Kai Han; Rui Song; Xiaojun Xu

doi:10.1117/12.2267510

12 May 2017 The thermal damage process of the contaminated optical element used in high energy laser system

Kai Han, Rui Song, Xiaojun Xu

Proceedings Volume 10173, Fourth International Symposium on Laser Interaction with Matter; 101730G (2017) https://doi.org/10.1117/12.2267510
Event: 4th International Symposium on Laser Interaction with Matter, 2016, Chengdu, China

Abstract

Fused silica optics were treated by dynamic etching using buffered hydrofluoric acid (BHF) with different etching depths. The transmissivity of fused silica slightly increases in deep UV (DUV) range after dynamic etching. Surface qualities of fused silica were characterized in terms of surface roughness, surface profile and photoluminescence (PL) spectra. The results show that dynamic etching has a slight impact on surface RMS roughness.PL defects gradually reduces by dynamic etching, and laser damage resistance of fused silica continuously increases with etching depth extending. When removal depth increases to ~12μm, the damage threshold is the double that of the unetched surface. However, surface profile continuously deteriorates with etching depth increasing. Appropriate etching amount is very important for improving damage resistance and mitigating surface profile deteriorating of fused silica during etching process simultaneously. The study is expected to contribute to the practical application of dynamic etching for mitigating laser induced degradation of fused silica optics under UV laser irradiation.

Citation Download Citation

Kai Han, Rui Song, and Xiaojun Xu "The thermal damage process of the contaminated optical element used in high energy laser system", Proc. SPIE 10173, Fourth International Symposium on Laser Interaction with Matter, 101730G (12 May 2017); https://doi.org/10.1117/12.2267510

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