Modification Of The Statistical Microroughness Of Surfaces By Thin Film Deposition: A Model

Heinz-Gunter Walther; Angela Duparre

doi:10.1117/12.949454

11 April 1989 Modification Of The Statistical Microroughness Of Surfaces By Thin Film Deposition: A Model

Heinz-Gunter Walther, Angela Duparre

Proceedings Volume 1015, Micromachining Optical Components and Precision Engineering; (1989) https://doi.org/10.1117/12.949454
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

A model describing the modification of a surface roughness profile due to thin film deposition is presented. Surface smoothing as well as roughening are found to be significant effects. Conclusions which can be drawn from the roughness model with respect to related light scattering make it possible to interpret film scattering experimentally observed.

Citation Download Citation

Heinz-Gunter Walther and Angela Duparre "Modification Of The Statistical Microroughness Of Surfaces By Thin Film Deposition: A Model", Proc. SPIE 1015, Micromachining Optical Components and Precision Engineering, (11 April 1989); https://doi.org/10.1117/12.949454

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