Impact of EUV SRAF on Bossung tilt

Yow-Gwo Wang; Stephen Hsu; Robert Socha; Andy Neureuther; Patrick Naulleau

doi:10.1117/12.2260160

24 March 2017 Impact of EUV SRAF on Bossung tilt

Yow-Gwo Wang, Stephen Hsu, Robert Socha, Andy Neureuther, Patrick Naulleau

Proceedings Volume 10143, Extreme Ultraviolet (EUV) Lithography VIII; 1014320 (2017) https://doi.org/10.1117/12.2260160
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Mask 3D (M3D) effects remain a significant challenge affecting EUV lithography (EUVL) imaging performance due to the comparable sizes of the mask and the EUV wavelength. Pre-compensation with the insertion of sub-resolution assist features (SRAFs) has been proposed as a solution to compensate M3D effects and improve the process window for advanced technology nodes. In this paper, we discuss the possible positive impact of SRAFs on Bossung tilt, and provide physical insight into the optical mechanisms at play enabling M3D effect mitigation. In particular, we consider an example isolated 2-bar (CD = 16 nm) pattern imaged under delta function dipole illumination. We compare the scattered order distribution and Bossung tilt with and without SRAFs. The results show that SRAFs actually introduce stronger effective single pole aberrations in the imaging process. However, the opposite impacts on Bossung tilt from each pole results in an overall improvement for dipole illumination. Reduced Bossung tilt and a 21% improvement of the overlapping process window are achieved by the insertion of asymmetric SRAFs into the 2-bar mask design.

Citation Download Citation

Yow-Gwo Wang, Stephen Hsu, Robert Socha, Andy Neureuther, and Patrick Naulleau "Impact of EUV SRAF on Bossung tilt", Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 1014320 (24 March 2017); https://doi.org/10.1117/12.2260160

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

SRAF

Photomasks

3D image processing

Extreme ultraviolet lithography

Imaging systems

3D modeling

Image processing

Show All Keywords

Keywords/Phrases

Search In:

Publication Years