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28 April 2017 Elastomeric phase masks and transfer stamps: fabrication methods for micro/nano optical systems (Conference Presentation)
John A. Rogers
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Proceedings Volume 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X; 101150F (2017) https://doi.org/10.1117/12.2249802
Event: SPIE OPTO, 2017, San Francisco, California, United States
Abstract
Research over the last decade has led to the emergence of several powerful methods for micro/nanofabrication, with direct relevance to optics and optoelectronic systems. This talk summarizes some of our contributions to this field, through the development techniques that use (1) conformal phase masks for photodefining 3D structures with applications in photonic crystals, (2) rubber transfer stamps for integrating inorganic semiconductor materials on plastic substrates for solid state lighting, emissive displays and efficient photovoltaics, and (3) stretchable assembly platforms for controlled transformation of 2D precursor structures into well-defined, complex 3D architectures for optical MEMS. In each case, we review the basic operating principles and provide some examples of enabled applications in optics and optoelectronics.
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View presentation recording on the SPIE Digital Library: http://dx.doi.org/10.1117/12.2249802.5395719071001
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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John A. Rogers "Elastomeric phase masks and transfer stamps: fabrication methods for micro/nano optical systems (Conference Presentation)", Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 101150F (28 April 2017); https://doi.org/10.1117/12.2249802
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KEYWORDS
Photomasks
3D displays
Optoelectronics
3D applications
Microopto electromechanical systems
Nanolithography
Photonic crystals
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