Inspection Of Patterned Wafer Surface Using Electrooptic Spatial Light Modulator

Hitoshi Tanaka; Youko Miyazaki; Noboru Mikami; Nobuyuki Kosaka; Toshimasa Tomoda

doi:10.1117/12.947886

8 February 1988 Inspection Of Patterned Wafer Surface Using Electrooptic Spatial Light Modulator

Hitoshi Tanaka, Youko Miyazaki, Noboru Mikami, Nobuyuki Kosaka, Toshimasa Tomoda

Proceedings Volume 0963, Optical Computing '88; (1988) https://doi.org/10.1117/12.947886
Event: Optical Computing '88, 1988, Toulon, France

Abstract

An electrooptic spatial light modulator, used as an intensity spatial filter, makes real-time inspection of periodic patterns possible by making the adjustment of object attitude unnecessary. The ways for preparing the filter and detecting defects in periodic pattern in real time are described. Results of detection of defects are presented.

Citation Download Citation

Hitoshi Tanaka, Youko Miyazaki, Noboru Mikami, Nobuyuki Kosaka, and Toshimasa Tomoda "Inspection Of Patterned Wafer Surface Using Electrooptic Spatial Light Modulator", Proc. SPIE 0963, Optical Computing '88, (8 February 1988); https://doi.org/10.1117/12.947886

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