Transformation Of Pattern Personality In E-Beam Lithography : A Conceptual Approach

F Coopmans; E Froyen; R Jonckheere

doi:10.1117/12.945652

14 June 1988 Transformation Of Pattern Personality In E-Beam Lithography : A Conceptual Approach

F Coopmans, E Froyen, R Jonckheere

Proceedings Volume 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII; (1988) https://doi.org/10.1117/12.945652
Event: Medical Imaging II, 1988, Newport Beach, CA, United States

Abstract

This paper discusses the concept of pattern personality and its application to the characterization of different software and technological aspects in E-Beam direct write lithography. In this approach the personality of a pattern is related to a spectrum of the characteristic dimensions of a design. We explain simple techniques to obtain these spectra and indicate how they can be implied to predict and decide on the best writing strategy. Pattern personality is intended to be used as a compressed format that still contains enough information to base decisions on and compute the impact of processing steps on the pattern fidelity.

Citation Download Citation

F Coopmans, E Froyen, and R Jonckheere "Transformation Of Pattern Personality In E-Beam Lithography : A Conceptual Approach", Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); https://doi.org/10.1117/12.945652

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