New Energy-Dependent Soft X-Rav Damage In MOS Devices

Tung-Yi Chan; Henry Gaw; Daniel Seligson; Lawrence Pan; Paul L. King; Piero Pianetta

doi:10.1117/12.945633

14 June 1988 New Energy-Dependent Soft X-Rav Damage In MOS Devices

Tung-Yi Chan, Henry Gaw, Daniel Seligson, Lawrence Pan, Paul L. King, Piero Pianetta

Proceedings Volume 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII; (1988) https://doi.org/10.1117/12.945633
Event: Medical Imaging II, 1988, Newport Beach, CA, United States

Abstract

An energy-dependent soft x-ray-induced device damage has been discovered in MOS devices fabricated using standard CMOS process. MOS devices were irradiated by monochromatic x-rays in energy range just above and below the silicon K-edge (1.84 keV). Photons below the K-edge is found to create more damage in the oxide and oxide/silicon interface than photons above the K-edge. This energy-dependent damage effect is believed to be due to charge traps generated during device fabrication. It is found that data for both n- and p-type devices lie along a universal curve if normalized threshold voltage shifts are plotted against absorbed dose in the oxide. The threshold voltage shift saturates when the absorbed dose in the oxide exceeds 1.4X105 mJ/cm3, corresponding to 6 Mrad in the oxide. Using isochronal anneals, the trapped charge damage is found to recover with an activation energy of 0.38 eV. A discrete radiation-induced damage state appears in the low frequency C-V curve in a temperature range from 1750C to 325°C.

Citation Download Citation

Tung-Yi Chan, Henry Gaw, Daniel Seligson, Lawrence Pan, Paul L. King, and Piero Pianetta "New Energy-Dependent Soft X-Rav Damage In MOS Devices", Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); https://doi.org/10.1117/12.945633

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