Compact SR Light Source For X-Ray Lithography

Noriyuki Takahashi

doi:10.1117/12.945631

14 June 1988 Compact SR Light Source For X-Ray Lithography

Noriyuki Takahashi

Proceedings Volume 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII; (1988) https://doi.org/10.1117/12.945631
Event: Medical Imaging II, 1988, Newport Beach, CA, United States

Abstract

The compact synchrotron-radiation (SR) source is being developed for industrial use, especially for X-ray lithography. This source named AURORA, consists of a 150-MeV microtron injector, a 650-MeV superconduct-ing electron storage ring, and SR light channels. The injector is a pulsed racetrack microtron, which is 1.1-m width, 3.7-m length, and 1.5-m height. The storage ring is a superconducting weak-focusing single-magnet machine of 1-m orbital diameter, having an outside diameter of 3 m and a height of 2.2 m. The source size is uniform throughout the circumference, ar=1.4 mm in the radial direction, and σz= 0.2 mm in the vertical direc-tion. The critical wavelength is 1.0 nm. The irradiative power is 1.5 W/mrad at a stored electron current of 300 mA. It is anticipated that the lifetime of the beam will exceed 24 hours. Sixteen outlets are available for SR emission from the ring. Prototype machines are presently under construction. The present status and details of the machines will be reported in a later section of this paper.

Citation Download Citation

Noriyuki Takahashi "Compact SR Light Source For X-Ray Lithography", Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); https://doi.org/10.1117/12.945631

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