Photospeed Quality Control In Photoresist Manufacturing

Jeffrey K. Hecht; Barbara J. Brown; Edward J. Reardon

doi:10.1117/12.968393

1 January 1988 Photospeed Quality Control In Photoresist Manufacturing

Jeffrey K. Hecht, Barbara J. Brown, Edward J. Reardon

Proceedings Volume 0921, Integrated Circuit Metrology, Inspection, and Process Control II; (1988) https://doi.org/10.1117/12.968393
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Process windows have shrunk dramatically with the advent of micron and submicron processes in semiconductor manufacturing. Because of this trend, photospeed testing has become an especially critical aspect of photoresist quality control. The purpose of this paper is to describe and evaluate and test methods which can be used by a manufacturer to qualify resist lots. In addition, the applications and benefits of Statistical Quality Control and photospeed certification programs are discussed.

Citation Download Citation

Jeffrey K. Hecht, Barbara J. Brown, and Edward J. Reardon "Photospeed Quality Control In Photoresist Manufacturing", Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); https://doi.org/10.1117/12.968393

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