Photoresist As It's Own Process Monitor

M. P. C. Watts; T. Perrera; B. Ozarski; D. Meyers; R. Tan

doi:10.1117/12.968341

1 January 1988 Photoresist As It's Own Process Monitor

M. P. C. Watts, T. Perrera, B. Ozarski, D. Meyers, R. Tan

Proceedings Volume 0920, Advances in Resist Technology and Processing V; (1988) https://doi.org/10.1117/12.968341
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

A new method of monitoring a photoresist process is described, in which the changes in the physical and chemical properties of the photoresist act as the monitor for each process step. This method provides unique insights into the photo process by independently monitoring each step and substantially improving the quantitative accuracy at each step. Examples of the potential of this method for process monitoring and process control improvements are given.

Citation Download Citation

M. P. C. Watts, T. Perrera, B. Ozarski, D. Meyers, and R. Tan "Photoresist As It's Own Process Monitor", Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); https://doi.org/10.1117/12.968341

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