New Diazoketone Dissolution Inhibitors For Deep U.V. Photolithography

C.Grant Willson; Robert D. Miller; Dennis R. McKean; Lester A. Pederson

doi:10.1117/12.940301

25 August 1987 New Diazoketone Dissolution Inhibitors For Deep U.V. Photolithography

C.Grant Willson, Robert D. Miller, Dennis R. McKean, Lester A. Pederson

Proceedings Volume 0771, Advances in Resist Technology and Processing IV; (1987) https://doi.org/10.1117/12.940301
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

The results of studies directed toward the design of diazoketone dissolution inhibitors for deep U.V. photolithography are described. This work has identified a useful chromophore, the 1,3-diacy1-2-diazo linkage which has the requisite spectral characteristics for use in the deep UV. Incorporation of appropriate hetero-atomes into the structure has allowed synthesis of analogs that survive common processing sequences. A detailed study of the photochemistry of these analogs led to an understanding of the importance of the stability of the ketene photoproduct on resist contrast. Imaging results are presented for a trilayer application and for excimer laser projection printing.

Citation Download Citation

C.Grant Willson, Robert D. Miller, Dennis R. McKean, and Lester A. Pederson "New Diazoketone Dissolution Inhibitors For Deep U.V. Photolithography", Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); https://doi.org/10.1117/12.940301

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