Paper
10 November 1986 Fabrication Of The Nonuniform Holographic Gratings For WDM
Jerzy Ostrowski, Ryszard Swillo, Mieczyslaw Szustakowski
Author Affiliations +
Proceedings Volume 0670, Optical Fibres and Their Applications IV; (1986) https://doi.org/10.1117/12.939005
Event: Optical Fibres and Their Applications, 1986, Warsaw, Poland
Abstract
The report with the technology production of nonuniform holographic gratings by means of argon laser type ILA-120 manufactured by Carl Zeiss Jena GDR. The points relief phase holograms were recorded in the AZ-1350 positive photoresist. The gratings had variable period from 0,4 μm to 1 μm and were sized up to 35 mm diameter. The grating obtained in the photoresist layer was coated by Al film, aproximately 1500 Å. The hologtaphic gratings were applied in the experimental pattern of wavelenght multi and demultiplexers reguired in the WDM optical communication systems.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jerzy Ostrowski, Ryszard Swillo, and Mieczyslaw Szustakowski "Fabrication Of The Nonuniform Holographic Gratings For WDM", Proc. SPIE 0670, Optical Fibres and Their Applications IV, (10 November 1986); https://doi.org/10.1117/12.939005
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KEYWORDS
Holography

Demultiplexers

Holograms

Photoresist materials

Wavelength division multiplexing

Argon ion lasers

Diffraction gratings

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