Paper
21 October 1986 Stability Of Multilayers At High Temperatures
E. Ziegler, Y. Lepetre, Ivan K. Schuller, E. Spiller
Author Affiliations +
Proceedings Volume 0640, Grazing Incidence Optics; (1986) https://doi.org/10.1117/12.964367
Event: 1986 Technical Symposium Southeast, 1986, Orlando, United States
Abstract
The temperature stability of metal (W, WRe, Co, Cr)-carbon multilayers has been studied using X-ray diffraction (θ-2θ and Debye-Scherrer) and electron microscopy. The results show that in all cases a crystallization occurs in the temperature range 650-750°C. As a consequence of this crystallization, the layered structure is destroyed, the surface of the film becomes rough and the X-ray reflectivity is considerably reduced. These results imply that efficient cooling or new multilayer structures will have to be developed for use at high temperatures or under high X-ray incident flux.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
E. Ziegler, Y. Lepetre, Ivan K. Schuller, and E. Spiller "Stability Of Multilayers At High Temperatures", Proc. SPIE 0640, Grazing Incidence Optics, (21 October 1986); https://doi.org/10.1117/12.964367
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KEYWORDS
Multilayers

Crystals

Reflectivity

Annealing

Chromium

Crystallography

Diffraction

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