Excimer Laser Projection Patterning With And Without Resists: Submicrometer Etching Of Diamond And Diamond-Like Carbon Resist

M. Rothschild; C. Arnonet; D. J. Ehrlich

doi:10.1117/12.963702

20 August 1986 Excimer Laser Projection Patterning With And Without Resists: Submicrometer Etching Of Diamond And Diamond-Like Carbon Resist

M. Rothschild, C. Arnonet, D. J. Ehrlich

Author Affiliations +

Proceedings Volume 0633, Optical Microlithography V; (1986) https://doi.org/10.1117/12.963702
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

Recently reported experiments in which the deep-UV (193-nm) and VUV (157-nm) output of an excimer laser has been applied to submicrometer patterning are reviewed. New methods have been designed to take advantage of the short-wavelength, high-peak-intensity pulsed radiation from these sources. The examples of patterning of crystalline diamond and diamond-like carbon films are discussed. Lines and spaces of 0.13 μm have been obtained using diamond-like hard carbon films as self-developing resists.

Citation Download Citation

M. Rothschild, C. Arnonet, and D. J. Ehrlich "Excimer Laser Projection Patterning With And Without Resists: Submicrometer Etching Of Diamond And Diamond-Like Carbon Resist", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963702

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