Submicron Proximity Correction By The Fourier Precompensation Method

Michael E. Haslam; John F. McDonald

doi:10.1117/12.963667

30 June 1986 Submicron Proximity Correction By The Fourier Precompensation Method

Michael E. Haslam, John F. McDonald

Proceedings Volume 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V; (1986) https://doi.org/10.1117/12.963667
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

The Fourier and Haar transforms have been successfully employed to produce fast, efficient proximity correction calculations for electron beam lithography. The Fourier transform is used in a precompensation operation that generates a nearly exact solution to the proximity problem. The Haar transform is used to thin or reduce the size of the extremely accurate but large corrected database that results. The methodology here constitutes a signal processing or transform oriented approach to proximity correction. It has the advantage that fast digital hardware is commercially available for making accelerated computations. Detailed computer generated simulations and experimental results are presented for four different test patterns. The critical lithography features are nested gaps between large features and isolated lines and squares ranging from 0.2 to 0.5 μm. The Fourier precompensation proximity correction approach successfully preserves the fidelity of these features as well as all other features in the test patterns.

Citation Download Citation

Michael E. Haslam and John F. McDonald "Submicron Proximity Correction By The Fourier Precompensation Method", Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); https://doi.org/10.1117/12.963667

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