Fib Mask Repair With Microtrim

Henry C. Kaufmann; William B. Thompson; Gregory J. Dunn

doi:10.1117/12.963669

30 June 1986 Fib Mask Repair With Microtrim

Henry C. Kaufmann, William B. Thompson, Gregory J. Dunn

Proceedings Volume 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V; (1986) https://doi.org/10.1117/12.963669
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

A FIB (focused ion beam) system for the repair of clear and opaque photomask defects is described. FIB technology is uniquely capable of repairing submicron clear and opaque defects. Opaque defects are repaired by ion beam sputtering. Clear defects are repaired by the deposition of a tenaciously adherent, opaque carbon film from a hydrocarbon gas. A number of mask repair examples are shown, and the results of adhesion and chemical resistance tests of the carbon films are presented.

Citation Download Citation

Henry C. Kaufmann, William B. Thompson, and Gregory J. Dunn "Fib Mask Repair With Microtrim", Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); https://doi.org/10.1117/12.963669

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