New Deep Uv Dyeable Negative Resist For CCD Micro Color Filter

Shin-ichi Sanada; Masataka Miyamura

doi:10.1117/12.963640

9 July 1986 New Deep Uv Dyeable Negative Resist For CCD Micro Color Filter

Shin-ichi Sanada, Masataka Miyamura

Proceedings Volume 0631, Advances in Resist Technology and Processing III; (1986) https://doi.org/10.1117/12.963640
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

Several kinds of dyeable negative photoresist materials for CCD micro color filters, developed in our Laboratories, are reported. Quaternary ammonium salt-terminating acrylate-glycidyl methacrylate copolymers with bisazides have been developed as negative working resists. Descriptions on their synthesis, lithographic data and the micro color filter process for these resists are mentioned.

Citation Download Citation

Shin-ichi Sanada and Masataka Miyamura "New Deep Uv Dyeable Negative Resist For CCD Micro Color Filter", Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); https://doi.org/10.1117/12.963640

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