Advanced Topics In Lithography Modeling

Chris A. Mack

doi:10.1117/12.963652

9 July 1986 Advanced Topics In Lithography Modeling

Chris A. Mack

Proceedings Volume 0631, Advances in Resist Technology and Processing III; (1986) https://doi.org/10.1117/12.963652
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

The model PROLITH is used to simulate advanced topics in lithography such as multi-level resists, contrast enhancement lithography, linewidth variations over topography, antireflective coatings, post-exposure bakes, and dyed photoresists. The applicability and usefulness of this model for these topics is discussed. Other areas in which the model PROLITH may be applied are suggested.

Citation Download Citation

Chris A. Mack "Advanced Topics In Lithography Modeling", Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); https://doi.org/10.1117/12.963652

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available