Measuring The Performance Of The AEBLE [sub]tm[/sub] 150 Direct-Write A-Beam Lithography Equipment

Allen M. Carroll; Jorge L. Freyer

doi:10.1117/12.947482

20 June 1985 Measuring The Performance Of The AEBLE _tm 150 Direct-Write A-Beam Lithography Equipment

Allen M. Carroll, Jorge L. Freyer

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947482
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

Lithographic pattern quality is of paramount importance for the fabrication of microcircuits with submicrometer critical dimensions. The AEBLE 150 direct-write e-beam lithography equipment recently announced by Perkin-Elmer is destined for application in the submicrometer domain, and it will employ on-line quality measurement tools to ensure consistent machine performance and productivity. In this paper, we discuss the strategies to be employed in developing pattern quality measurement tools for AEBLE, and we illustrate early results obtained using the prototype AEBLE and mensuration techniques developed for Perkin-Elmer's mask-making product, MEBES® III. These preliminary results will be used to guide the evolution of AEBLE's quality-assurance tools. We present a scenario for that evolution, including a discussion of measurable parameters and user interfaces.

Citation Download Citation

Allen M. Carroll and Jorge L. Freyer "Measuring The Performance Of The AEBLE _tm 150 Direct-Write A-Beam Lithography Equipment", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947482

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