Contamination Lithography For The Fabrication Of Zone Plate X-Ray Lenses

C. J. Buckley; M. T. Browne; P. Charalambous

doi:10.1117/12.947504

20 June 1985 Contamination Lithography For The Fabrication Of Zone Plate X-Ray Lenses

C. J. Buckley, M. T. Browne, P. Charalambous

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947504
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

A VG HB5 STEM has been modified to allow computer controlled contamination writing on thin Carbon substrates. Line widths of 20 nM and height to width aspect ratios of better than 5:1 can be drawn. This writing has been used to fabricate Fresnel zone plates. A patching process is involved with registration to an accuracy of 2.5 nM. Methods and techniques have been developed to compensate for non-linearity of the field scans together with specimen drift. Zone plates of 50 NM diameter and outer zone widths of 40 nM have been con-structed.

Citation Download Citation

C. J. Buckley, M. T. Browne, and P. Charalambous "Contamination Lithography For The Fabrication Of Zone Plate X-Ray Lenses", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947504

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