Registration Analysis Of 1/10 Steppers, 1/1 Orojections And Their Hybrid

S. Uoya; W. Wakamiya; H. Abe; H. Nakata

doi:10.1117/12.935125

7 November 1983 Registration Analysis Of 1/10 Steppers, 1/1 Orojections And Their Hybrid

S. Uoya, W. Wakamiya, H. Abe, H. Nakata

Proceedings Volume 0394, Optical Microlithography II: Technology for the 1980s; (1983) https://doi.org/10.1117/12.935125
Event: 1983 Microlithography Conferences, 1983, Santa Clara, United States

Abstract

This paper describes the comparison of registration accuracies at device fabrication level, and the analysis of their registration errors, in 1/10 steppers(GCA 4800 DSW), 1/1 scanning projection aligns (Perkin-Elmer 140), and their hybrid. The registration accuracy (6R) was evaluated by fabricating an n-MOS test device of double poly-Si structure at 50 - 54 dies a 4"0 wafer. For the analysis of registration errors, five independent factors such as alignment error (6A), machine stability-and-compatibility error (6D), mask error (6M), mask thermal expansion error (6T), and residual error(6r), which are responsible for registration error, were quantitatively measured, including their long period variation.

Citation Download Citation

S. Uoya, W. Wakamiya, H. Abe, and H. Nakata "Registration Analysis Of 1/10 Steppers, 1/1 Orojections And Their Hybrid", Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); https://doi.org/10.1117/12.935125

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