Future Possibilities Of Dioptric Lenses In Microelectronics

Gerhard Ittner

doi:10.1117/12.955361

8 August 1977 Future Possibilities Of Dioptric Lenses In Microelectronics

Gerhard Ittner

Proceedings Volume 0100, Developments in Semiconductor Microlithography II; (1977) https://doi.org/10.1117/12.955361
Event: Developments in Semiconductor Microlithography II, 1977, San Jose, United States

Abstract

After a survey of the present state of optics in microelectronics future possibilities especially of dioptric lenses are discussed. Those lenses are marked mainly by the numerical aperture providing the resolution, and the diameter of image field. The numerical aper-ture seems to have a usefull limit between 0.4 and 0.5, providing minimum line widths of 0.4 to 0.7 microns. A future limit of field sizes cannot be given today. The possibility to develop new lenses is not only given by the capability of the optical designer, but also by other parameters, such as mechanical size limitations and lens manufactoring problems.

Citation Download Citation

Gerhard Ittner "Future Possibilities Of Dioptric Lenses In Microelectronics", Proc. SPIE 0100, Developments in Semiconductor Microlithography II, (8 August 1977); https://doi.org/10.1117/12.955361

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available