Line Width Measurement By Diffraction Pattern Analysis

Harvey L. Kasdan; Nicholas George

doi:10.1117/12.954834

20 September 1976 Line Width Measurement By Diffraction Pattern Analysis

Harvey L. Kasdan, Nicholas George

Proceedings Volume 0080, Developments in Semiconductor Microlithography; (1976) https://doi.org/10.1117/12.954834
Event: Developments in Semiconductor Microlithography, 1976, San Jose, CA, United States

Abstract

The problem of measuring critical dimensions on photolithographic masks is becoming more acute as production linewidths dip below 2 μm. Visual techniques based on filar and image shearing eyepieces are limited by instrument resolution and operator acuity and consistency. An automatic system, based on diffraction pattern analysis, has been developed. Subjective operator judgment is not required to complete a measurement. Repeatability of 1% has been demonstrated for lines and gaps as small as 1.5 μm. The technique and device will be described and detailed experimental results will be presented. An analysis of the technique limitations shows that the current technique can easily be extended to measure the 0.5 to 1 μm widths. The ultimate potential may well be 1 microinch resolution at 1 microinch widths. Thus, diffraction pattern analysis may be the only viable alternative to the scanning electron microscope for submicrometer production line testing.

Citation Download Citation

Harvey L. Kasdan and Nicholas George "Line Width Measurement By Diffraction Pattern Analysis", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954834

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