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30 April 2023 Challenges in advanced 300mm silicon photonics technology
Massud A. Aminpur, Erik Geiss, Vijayalakshmi Seshashalam, Brendan O'Brien, Jean Raymod Fakhoury, Joerg Paufler, San Leong Liew, Ken Shea, Keith Donegan, Ryan Sporer, Wenhe Lin
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Proceedings Volume PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII; PC124990A (2023) https://doi.org/10.1117/12.2658702
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
Abstract
This conference presentation was prepared for the Advanced Etch Technology and Process Integration for Nanopatterning XII conference at SPIE Advanced Lithography + Patterning 2023.
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© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Massud A. Aminpur, Erik Geiss, Vijayalakshmi Seshashalam, Brendan O'Brien, Jean Raymod Fakhoury, Joerg Paufler, San Leong Liew, Ken Shea, Keith Donegan, Ryan Sporer, and Wenhe Lin "Challenges in advanced 300mm silicon photonics technology", Proc. SPIE PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII, PC124990A (30 April 2023); https://doi.org/10.1117/12.2658702
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KEYWORDS
Silicon photonics
Data centers
Diodes
Germanium
Manufacturing
Modulators
Quantum computing
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