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A nitride-based light-emitting structure composed of a GaN nanowire core and a GaInN/GaN multi-quantum shell (MQS) is promising for high performance optoelectronic devices. By growing high crystalline quality MQS on the nonpolar (m-plane) sidewall of the nanowires, an improvement of luminous efficiency is expected. In this work, we induced the sputtering growth of n++-GaN shell on the tunnel junction/p-GaN/MQS/nanowire structures. By performing sputtering by the optimized condition, we were able to demonstrate a device with an operating voltage of about 1.0 V lower than that of the sample without sputtering.
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