PROCEEDINGS VOLUME 3334
23RD ANNUAL INTERNATIONAL SYMPOSIUM ON MICROLITHOGRAPHY | 22-27 FEBRUARY 1998
Optical Microlithography XI
Editor(s): Luc Van den Hove
Editor Affiliations +
23RD ANNUAL INTERNATIONAL SYMPOSIUM ON MICROLITHOGRAPHY
22-27 February 1998
Santa Clara, CA, United States
Phase-Shifting Masks
Hua-Yu Liu, Linard Karklin, Yao-Ting Wang, Yagyensh C. Pati
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310717
Regina T. Schmidt, Chris A. Spence, Luigi Capodieci, Zoran Krivokapic, Bernd Geh, Donis G. Flagello
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310750
Yorick Trouiller, N. Buffet, Thierry Mourier, Patrick Schiavone, Yves Quere
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310761
Takashi Nakabayashi, Koji Matsuoka, Shigeo Irie, Hiromasa Fujimoto, Takayuki Yamada, Shuichi Mayumi
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310770
DongHo Cha, Jongwook Kye, Nakgeuon Seong, Hoyoung Kang, Hanku Cho, Joo-Tae Moon
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310780
CD Control Scanners
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310789
Takayuki Uchiyama, Takeo Hashimoto, Masashi Fujimoto, Seiji Matsuura, Tamio Yamazaki, Kunihiko Kasama
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310802
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310813
Mask CD Effects and OPC I
Alfred K. K. Wong, Richard A. Ferguson, Lars W. Liebmann, Scott M. Mansfield, Antoinette F. Molless, Mark O. Neisser
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310718
Dongseok Nam, Junghyun Lee, Chang-Hwan Kim, Seong-Woon Choi, Hoyoung Kang, Joo-Tae Moon
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310727
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310737
Pat G. Watson, Raymond A. Cirelli, Allen G. Timko, Omkaram Nalamasu, Carl Lockstamphor, Steven D. Berger, Neil J. Bassom, Ganesh Sundaram
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310743
Lithography Modeling
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310744
Hiroshi Fukuda, Keiko T. Hattori
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310745
Andreas Erdmann, Michael Arnz, Mireille Maenhoudt, Jan Baselmans, Jan-Chris van Osnabrugge
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310746
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310747
Chang Hsu, Rona Yang, Jeffery Cheng, Peter Chien, Victor Wen, Andrew R. Neureuther
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310748
OPC II
Michael E. Kling, Kevin D. Lucas, Alfred J. Reich, Bernard J. Roman, Harry Chuang, Percy V. Gilbert, Warren D. Grobman, Edward O. Travis, Paul Tsui, et al.
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310749
Chul-Hong Park, Yoo-Hyon Kim, Hoong-Joo Lee, Jeong-Taek Kong, Sang-Hoon Lee
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310751
Kohji Hashimoto, Satoshi Usui, Shigeru Hasebe, Masayuki Murota, Takeo Nakayama, Fumitomo Matsuoka, Soichi Inoue, Sachiko Kobayashi, Kazuko Yamamoto
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310752
Jack Q. Zhao, Joseph G. Garofalo, James W. Blatchford, Edward Ehrlacher, Ellis Nease
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310753
Wilhelm Maurer, Christoph Dolainsky, Joerg Thiele, Christoph M. Friedrich, Paul Karakatsanis
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310754
Image Quality
Christopher J. Progler, Donald C. Wheeler
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310755
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310756
Joseph P. Kirk, Christopher J. Progler
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310757
Ilya M. Grodnensky, Etsuya Morita, Kyoichi Suwa, Shigeru Hirukawa
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310758
Takashi Saito, Hisashi Watanabe, Yoshimitsu Okuda
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310759
Antireflective Layers
Shinji Kishimura, Makoto Takahashi, Keisuke Nakazawa, Takeshi Ohfuji, Masaru Sasago, Masaya Uematsu, Tohru Ogawa, Hiroshi Ohtsuka
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310760
Maaike Op de Beeck, Geert Vandenberghe, Patrick Jaenen, Feng-Hong Zhang, Christie Delvaux, Paul Richardson, Ilse van Puyenbroeck, Kurt G. Ronse, James E. Lamb III, et al.
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310762
Qizhi He, Wei W. Lee, Maureen A. Hanratty, Daty Rogers, Guoqiang Xing, Abha Singh, Eden Zielinski
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310763
Atsushi Sekiguchi, Fumikatsu Uesawa, Koichi Takeuchi, Tatsuji Oda
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310764
Ramkumar Subramanian, Gurjeet S. Bains, Christopher F. Lyons, Bhanwar Singh, Ernesto Gallardo
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310765
Process Optimization and Enhancement Techniques
Mark O. Neisser, Antoinette F. Molless
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310766
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310767
Alessandro Callegari, Katherina Babich, Fuad Doany, Frank Cardone, Sampath Purushothaman
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310768
Advanced Exposure Tools
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310769
Peter van Oorschot, Bert Koek, Jeroen van der Spek, Eric Stuiver, Hans Franken, Herman Botter, Reiner B. Garreis
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310771
Ryuichi Ebinuma, Kazunori Iwamoto, Hiroaki Takeishi, Hiroshi Itoh, Mitsuru Inoue, Kazuhiro Takahashi, Masakatsu Ohta
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310772
Timothy J. Wiltshire, Joseph P. Kirk, Donald C. Wheeler, Christopher Obszarny, James T. Marsh, Donald M. Odiwo
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310773
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310774
193-nm Issues and Alignment
Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, Ray S. Uttaro, Andrew Grenville, Allen Keith Bates, Chris K. Van Peski
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310775
Vladimir Liberman, Roderick R. Kunz, Mordechai Rothschild, Jan H. C. Sedlacek, Ray S. Uttaro, Andrew Grenville, Allen Keith Bates, Chris K. Van Peski
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310776
Joseph P. Kirk, Jung H. Yoon, Timothy J. Wiltshire
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310777
Amir Aalam Ghazanfarian, Xun Chen, Mark A. McCord, Roger Fabian W. Pease
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310778
Etsuya Morita, Masaharu Kawakubo, Frank C. Leung, Sean J. McNamara, Joseph T. Parry
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310779
Poster Session I: Enhancement Techniques
Norio Hasegawa, Katsuya Hayano, Akira Imai, Naoko Asai, Shinji Okazaki
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310781
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310782
Z. Mark Ma, Andrew Andersson
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310783
Chuen-Huei Yang, Chang-Ming Dai
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310784
Lay Cheng Choo, Siu Chung Tam, Alex Cheng, Ida Chui Shan Ho
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310785
Xunan Chen, Xiangang Luo, HanMin Yao, Qian Xiao, Guobin Yu
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310786
Miklos Erdelyi, Zsolt Bor, Gabor Szabo, Frank K. Tittel
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310787
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310788
Poster Session II: CD Control
Shoji Hotta, Toshihiko Onozuka, Keiko Fukumoto, Seiichiro Shirai, Shinji Okazaki
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310790
Jacek K. Tyminski, Sean J. McNamara, Stephen A. Meisner, Ronald R. Gorham
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310791
Jan Pieter Kuijten, Frank Duray, Ted der Kinderen
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310792
Young-Chang Kim, Gisung Yeo, Hye-soo Shin, Hak Kim, Hoyoung Kang, U-In Chung
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310793
CD Control Scanners
Pradeep K. Govil, James G. Tsacoyeanes, Randell P. Eron, Dave Walters
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310794
Poster Session III: Advanced Masks
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310795
Hisatsugu Shirai, Kanji Takeuchi, Kazumasa Shigematsu
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310796
Poster Session IV: Process Optimization
KeunYoung Kim, Stanley Barnett, James Shih
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310797
Hyoungjoon Kim, Sunggi Kim, Chang-Hwan Kim, Jin Hong, Junghyun Lee, Hoyoung Kang, Joo-Tae Moon
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310798
Poster Session V: Reflection Effects
James A. Bruce, Ellen Wallander
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310799
James A. Bruce, Michael D. Caterer, Dianne L. Sundling
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310800
Kyung-Jin Shim, Byoung-Il Choi, Ki-Yeop Park, Won-Kyu Lee
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310801
Poster Session VI: Simulation
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310803
Changtai Yu, Fengzhen Guo, Ying Chen, Hua Yu
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310804
Xiaolei Li, Kevin D. Lucas, Aaron L. Swecker, Andrzej J. Strojwas
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310805
Mark E. Mason, Robert A. Soper
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310806
Leonhard Mader, Christoph M. Friedrich
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310807
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310808
Heinrich Kirchauer, Siegfried Selberherr
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310809
Choong-Ki Seo, Seung-Gol Lee, Jong-Ung Lee
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310810
Mariusz Niewczas, Xiaolei Li, Andrzej J. Strojwas, Wojciech P. Maly
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310811
Seung-Gol Lee, Choong-Ki Seo, Dong-Hoon Lee, Jong-Ung Lee, MeangHyo S. Cho
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310812
Uwe Hollerbach
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310814
Pary Baluswamy, Thomas R. Glass
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310815
Bo Zhou, Barry A. McPherron
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310816
Poster Session VII: Image Quality
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310817
Audrey M. Davis, Andrew E. Bair, Bradley D. Lantz, Jeffrey R. Johnson, Charles R. Spinner III
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310818
Joseph P. Kirk
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310819
Kouichirou Tsujita, Junjiro Sakai, Akihiro Nakae, Shuji Nakao, Wataru Wakamiya
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310820
Nakgeuon Seong, Jongwook Kye, Hoyoung Kang, Joo-Tae Moon
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310821
Poster Session VIII: OPC
Y. O. Chen, D. L. Huang, K. T. Sung, J. J. Chiang, M. Yu, F. Teng, Lung Chu, Juan C. Rey, Douglas A. Bernard, et al.
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310822
Tsai-Sheng Gau, Chien-Ming Wang, Chang-Ming Dai
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310823
Franklin M. Schellenberg, Hua Zhang, Jim Morrow
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310719
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310720
Angelika Jungmann, Joerg Thiele, Christoph M. Friedrich, Rainer Pforr, Wilhelm Maurer
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310721
Jinglei Du, Qizhong Huang, Yongkang Guo, Zheng Cui
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310722
Poster Session IX: Exposure Tools and Subsystems
Izumi Tsukamoto, Hirohiko Shinonaga
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310723
Xun Chen, Amir Aalam Ghazanfarian, Mark A. McCord, Roger Fabian W. Pease
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310724
Dohoon Kim, Jong-Soo Kim, Yeung Joon Sohn, Jin Hyuk Kwon, Kag Hyeon Lee, Sang-Soo Choi, Hai Bin Chung, Hyung Joun Yoo, Bo Woo Kim
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310725
Hsun-Peng Lin, Chih-Hsiung Lee, Yi-Chyuan Lo, Kuo-Liang Lu
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310726
Kag Hyeon Lee, Dohoon Kim, Jong-Soo Kim, Sang-Soo Choi, Hai Bin Chung, Hyung Joun Yoo, Bo Woo Kim
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310728
Chantal G. Khan Malek, Volker Saile, J. Michael Klopf, Louis Rupp, Steven Nguyen
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310729
Uwe Stamm, Rainer Paetzel, Juergen Kleinschmidt, Klaus Vogler, Wolfgang Zschocke, Igor Bragin, Dirk Basting
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310730
Thomas P. Duffey, Todd J. Embree, Toshihiko Ishihara, Richard G. Morton, William N. Partlo, Tom A. Watson, Richard L. Sandstrom
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310731
Alexander I. Ershov, Thomas Hofmann, William N. Partlo, Igor V. Fomenkov, George Everage, Palash P. Das, Dave Myers
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310732
Tatsuo Enami, Osamu Wakabayashi, Toshihiro Nishisaka, Natsushi Suzuki, Takashi Nire, Hakaru Mizoguchi, Hiroaki Nakarai, Hirokazu Tanaka, Tatsuya Ariga, et al.
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310733
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310734
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310735
Klaus R. Mann, Eric Eva
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310736
Jin Hyuk Kwon, Yeung Joon Sohn, Hyo Chang Hwang, Dohoon Kim, Hai Bin Chung
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310738
Process Optimization and Enhancement Techniques
Raymond A. Cirelli, Masis M. Mkrtchyan, Pat G. Watson, Lee E. Trimble, Gary R. Weber, David L. Windt, Omkaram Nalamasu
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310739
Poster Session IX: Exposure Tools and Subsystems
Sen-Shan Yang
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310740
In-Ho Park, Hye-Keun Oh, S. B. Hyun
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310741
Ronald A. Carpio, Alan Stephen, Jeffrey A. Eisele
Proceedings Volume Optical Microlithography XI, (1998) https://doi.org/10.1117/12.310742
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