Reticles By Automatic Pattern Generation

Gerald M. Henriksen

doi:10.1117/12.955358

8 August 1977 Reticles By Automatic Pattern Generation

Gerald M. Henriksen

Proceedings Volume 0100, Developments in Semiconductor Microlithography II; (1977) https://doi.org/10.1117/12.955358
Event: Developments in Semiconductor Microlithography II, 1977, San Jose, United States

Abstract

The automatic production of reticles for semiconductor masks has become a well-established production technique using optical pattern generators. The important characteristics of these generators are defined and a comparison made of the types in general use today. The advantages and disadvantages of the optical and electron beam generators as related to reticle-making are defined and discussed. In a general overview of mask requirements, the characteristics of masks currently in use are related to the trends of the future.

Citation Download Citation

Gerald M. Henriksen "Reticles By Automatic Pattern Generation", Proc. SPIE 0100, Developments in Semiconductor Microlithography II, (8 August 1977); https://doi.org/10.1117/12.955358

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